SGT Silicon Glen Technology - Scotland's semiconductor equipment supplier

Polyflow

Wafer Reclaim
Wafer Reclaim Station (S-1615)
The S-1615, Wafer Reclaim Station provides six process sinks each capable of holding a single standard 200mm Teflon cassette. A single robot with corrosion protection will process the cassettes of wafers sequentially through the cleaning sinks as defined below. End effectors will be made of PVDF (dual cassettes can be in process with dedicated recipes per cycle) Staging queues for two cassettes each are provided at both ends of the station . Operator incursion into either queue will be detected and collision avoidance hardware/software will prevent injury. Robot positions and process sequence are fully programmable.

Process sink A is designated as a concentrated/dilute HF process at 49% (as delivered by BCDS) however, this can be programmed to be diluted. It has no temperature monitoring or control capabilities.

Process sink B is designated as a concentrated/dilute HF process at 49% (as delivered by BCDS) however, this can be programmed to be diluted. It has no temperature monitoring or control capabilities.

Process sink C is equipped with adjustable power megasonics capable of generating up to 700 watts. Particle removal efficiency is more than 95%. The designated process is NH40H/H2O2/DIW at 50°C. The plumbing circuit is fitted with an inline Teflon heater providing a temperature accuracy of plus or minus 2°C.

B. Sink A (PVDF) = DIW/HF 0-100% programmable blends QDR A (PVDF) = Quick Dump Rinser with overflow programming
Sink B (PVDF) = SIW/HF 0-100% programmable blends QDR B (PVDF) = Quick Dump Rinser with overflow programming
Sink C (quartz) = DIW/Ammonium Hydroxide/Peroxide (Megasonic) QDR C (PVDC) = Quick Dump Rinser with overflow programming.
Note 2: Sink C is isolated from all HF fumes

C. Process and safety functions are controlled and monitored by the latest version of Poly-Flow's graphic, touch screen PC-based Process Control Management System (PCMS). Included Windows- based software provides on-screen-graphic display of operation and maintenance manuals, program function charts, and mechanical drawings. PCMS monitors, queues, and coordinates all robot sequences. It also monitors the operator's workstations for intrusions into the robots working envelopes and initiates a controlled shut down response if necessary. It provides history logging of all events including failures and program execution for archiving and process proof. PCMS manages failure conditions and controls safe shut down of the appropriate systems. PCMS has ten levels of password protected programming, nine levels of which are user accessible.

D. Three QDRs are provided and are fitted with nitrogen bubbles and a DIW gentle cascade fill (nitrogen bubbles typically raise particle counts, therefore, bubblers caps are provided when not used). The QDR's are capable of high flow filling and low flow stand-by, and they are dumped via twin bottom dump doors (one for concentrated drain, and one for DIW reclaim draing}. A separate D1 reclaim capability is included with time-based programmability. Each end of the work deck and the plumbing compartment areas feature a Teflon D1 gun, nitrogen gun, and aspirator. A glove wash is located to the right side of the work deck with automatic activation.

E. The chemical process sinks are recirculating etch modules, White Knight pumps are connected to 10 inch nominal Millipore Chemgard filter housings. Each filter housing is furnished with a single Millipore PF 80/ATX element. The chemical process sinks have automatic lids and they are capable of automatic blending of programmable ratios of the specified chemicals from a bulk delivery system furnished by others. BCDS interface includes dry contacts for chemical ready, chemical request and system up. Each sink has primary and secondary liquid level sensors. All process sinks are drained automatically during regeneration or can be manually drained if desired.