CVD
 Quester
300 Parts Cleaning System (S-1482)
The S-1482 cleans the silicon carbide
susceptors and the quartz plates from the Quester APT-6000 TEOS deposition
systems.
This tool builds on the successful S-1377, which
provides thorough etching and rinsing, New features include the
exclusive PCMS touch-screen control system for recipe building and
data-logging. Ergonomic compliance is assured with the robotic loading
platform. The unit will efficiently handle the weight of a full
set of 300mm parts which total nearly 150 pounds.
The S-1482 is constructed of Corzan-4910, and
includes many design elements to allow it to be installed withgout
the need for fire detection or suppression.
A. Quester 300 Parts Cleaning
System (S-1482)
 Cleans silicon
carbide susceptors and quartz plates from the Quester APT -4300
and APT -6000 TEOS deposition systems.
Robotic loading
platform helps ensure ergonomic compliance.
Constructed of
fire safe Corzan-4910 eliminating the need for fire detection or
suppression.
B. AMAT Nitride Parts Cleaner (S-1052)
Special fixturing
ensures proper cleaning of three ceramic chamber rings at once.
Dual connections
to bulk chemical distribution system are standard.
Cleaning mixtures
are accurately blended in the 24" X 24" X 12' deep process
sink
C. AME Bell Jar Cleaner (S-1115)
Safely clean heavy
Applied Materials bell jars.
Robotic arm for
lifting and positioning meets S-8 ergonomic requirements. On-demand integral UPW heater (up to 50° C).
High pressure UPW pistol with automatic pump
D. Quester Parts Cleaner (S-1377)
Fully automatic
cleaning system designed for Quester parts. Quester 300 Parts Cleaning
System (S-1482)
Specialized fixturing
holds silicon carbide susceptors and quartz shielding plates in
exact alignment to ensure proper etching and rinsing.
Targeted agitation
is combined with recirculation and filtratior we as t e -eposllon
sys ems. to maximize acid utilization.
E. Silicon Carbide Boat Cleaning System (S-1278)
High volume system
with five dedicated process sinks, each with quick dump rinsing
capability.
Simultaneous,
independent operation for maximum throughput.
Three chemical
processes are pre-programmed for use in removing polysilicon, nitride
and silicides.
F. 5VG-CVD Parts Cleaner (S-1055-1) (formerly
Watkins-Johnson)
Clean large volumes
of shields, muffle etch assemblies and muffle etch injectors with
precise recipes.
Secondary containment
and redundant leak detection.
Meet important H6 requirements with less than 25 gallons of chemical
on board.
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